1600°C Vacuum Atmosphere Tube Furnace CVD System for Semiconductor & Nanotech Applications
For semiconductor, nanotechnology, fiber and other sectors, the Vacuum Atmosphere Tube Furnace CVD System offers a precise experimental environment with vacuum, controllable atmosphere and 1600°C high temperature. It enables key CVD processes including silicon carbide coating, ceramic substrate conductivity testing, controlled ZnO nanostructure growth, and ceramic capacitor (MLCC) atmosphere sintering.
- modelCVD-LTF16P/ CVD-LTF16T Series
- brandLABEKS
- min. order1 pcs
- packageplywood case package
description
Designed for semiconductor, nanotechnology, fiber and related industries, the 1600°C Vacuum Atmosphere Tube Furnace CVD System (CVD-TF) creates a controlled experimental environment featuring vacuum, adjustable atmosphere, and high-temperature conditions. This specialized CVD growth platform supports a range of critical processes, including silicon carbide coating, ceramic substrate conductivity testing, controlled growth of ZnO nanostructures, and atmosphere sintering of ceramic capacitors (MLCC).
features
Automatic power-off activates upon furnace door opening, paired with over-temperature protection and leakage protection functions to ensure safe operation.
Overheating alarm, menu lock, overheat prevention, and power recovery delay provide enhanced operational safety safeguards.
One-way valve technology controls gas flow within a manageable pressure range, further reinforcing operational safety.
When the electric furnace starts, the exhaust fan runs automatically and continues operating until the furnace body temperature drops below 60 °C, effectively protecting the furnace surface from damage.
The furnace is constructed using polycrystalline mullite fiber via vacuum adsorption, delivering uniform temperature distribution and reducing energy consumption by more than 50%.
Self-developed air diversion and heat insulation technology extends the service life of internal components while maintaining consistent temperature performance in the chamber.
The circuit system adopts continuous heating output mode with dual-circuit power supply, and separate wiring for strong and weak currents enhances overall system stability.
The heating module utilizes DC signal adjustment for output power, eliminating induced electrical interference to control signals.
Automatic and manual control switching functionality is available: in automatic mode, the vacuum pump is activated/deactivated based on set values to maintain the container within a specific vacuum pressure range; manual mode allows users to directly operate the vacuum pump via dedicated on/off buttons, catering to diverse experimental requirements. (Medium vacuum control system)
Solenoid valve slow-start technology delays valve opening by 10 seconds after vacuum pump activation, ensuring precise control of furnace tube system pressure and preventing exhaust gas backflow that could impair experimental results. (Medium vacuum control system)
A digital flow display instrument, paired with a mass flow controller, enables data collection and flow regulation. This setup boasts excellent repeatability, fast response speed, and stable, reliable performance. (Gas Mass Flow Control System)
A gas mixing tank device ensures full gas homogenization before introduction into the working chamber, while preventing gas leakage.
Low-voltage metal buttons with status indicator lights are used for operation, enabling safe and intuitive control.
Aviation plugs connect the upper and lower furnace bodies, ensuring safe, reliable, and convenient assembly.
The gas circuit assembly is fabricated from food-grade 316 stainless steel, offering corrosion resistance, atmospheric corrosion resistance, high-temperature tolerance, and non-magnetic properties.
specifications
Model | CVD-LTF16P50 | CVD-LTF16P60 | CVD-LTF16P80 | CVD-LTF16P100 | CVD-LTF16P60S | CVD-LTF16P80S | CVD-LTF16P100S | |||
|---|---|---|---|---|---|---|---|---|---|---|
CVD-LTF16T50 | CVD-LTF16T60 | CVD-LTF16T80 | CVD-LTF16T100 | CVD-LTF16P60S | CVD-LTF16T80S | CVD-LTF16T100S | ||||
Operating temperaturerange | 300~1600℃ | |||||||||
Temperatureresolution | 1℃ | |||||||||
Temperaturecontrol | ±1℃ | |||||||||
Heating rate | 0~20℃/min | |||||||||
Heating zonelength | 260mm | 600mm | ||||||||
Length ofconstant temperature zone | 120mm | 300mm | ||||||||
degree ofvacuum | -0.1MPa | |||||||||
Emptyfurnace heating time | ＜15min | |||||||||
Exterior | Cold-rolledsteel sheet with chemical-resistant coating on the surface | |||||||||
Furnace body | PolycrystallineMullite Fiber | |||||||||
Furnace size | 440*390*330 | 780*390*330 | ||||||||
Furnace tube | CorundumTube | |||||||||
Furnace tubesize | φ50*1000 | φ60*1000 | φ80*1000 | φ100*1000 | φ60*1200 | φ80*1200 | φ100*1200 | |||
Heater | Siliconmolybdenum rod | |||||||||
Heatingpower | 4KW | 4KW | 10KW | 10KW | ||||||
Thermalinsulation layer | Double-layerforced air diversion | |||||||||
Controller | P: Importedprogram temperature control digital display; T: 7-inch color touch screenprogram temperature control | |||||||||
Controlmethod | Usemicrocomputer PID control / S-type dual temperature zone separate temperaturecontrol | |||||||||
How to set | P: Touch thefive buttons for action, digital display setting; T: Touch the finger to set | |||||||||
Displaymethod | P:Double-line LED digital display; T: Color LCD display | |||||||||
Timing | 0~999.9hours | |||||||||
Run function | Fixed valueoperation, program operation | |||||||||
Program mode | P: Program running,4 curves, 40 steps in total; T: 50 steps can call the stored program | |||||||||
Sensor | Type Sthermocouple | |||||||||
Auxiliaryfunction | P:Correction function; T: Correction function, real-time curve recording, Udisk data export | |||||||||
Safetyequipment | Overcurrentleakage protection switch | Overcurrentprotection switch | ||||||||
Number ofair paths | 3 channels(the number of air channels can be selected according to specific needs) | |||||||||
Flow range | 0-0500sccm(standard ml/min, optional) nitrogen standard | |||||||||
Precision | ±1%F.S | |||||||||
Responsetime | ≤4s | |||||||||
Operatingtemperature (flow meter) | 5-45℃ | |||||||||
Workpressure | Inletpressure 0.05-0.3MPa (gauge pressure) | |||||||||
Systemconnection | Adopt KFquick connection bellows, high vacuum manual flapper valve and digitaldisplay vacuum measuring instrument | |||||||||
Systemvacuum range | 10-100Pa | |||||||||
Vacuum pump | Thetheoretical ultimate vacuum degree of the two-stage mechanical pump is 3×10-1Pa,the pumping rate is 4L/s, the air outlet is equipped with an oil filter, therated voltage is 200V, and the power is 0.55Kw | |||||||||
CVD systemconfiguration | 1600 degreevacuum tube furnace (optional single temperature zone, double temperaturezone) Multi-channel mass flow control system Vacuum system | |||||||||
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