1400℃ Vacuum Atmosphere Tube Furnace CVD System for SiC Coating & Sintering
Delivering a stable experimental environment with vacuum, controlled atmosphere, and high-temperature conditions, this vacuum atmosphere tube furnace CVD system supports silicon carbide coating, ceramic substrate conductivity testing, controlled ZnO nanostructure growth, and MLCC atmosphere sintering experiments.
- modelCVD-LTF14P/ CVD-LTF14T Series
- brandLABEKS
- min. order1 pcs
- packageplywood case package
description
Establishes a dependable experimental setting featuring vacuum, regulated atmospheric conditions, and elevated temperatures up to 1400℃.
Optimized for a range of CVD-based procedures, including silicon carbide coating application, ceramic substrate conductivity assessment, controlled growth of ZnO nanostructures, and atmosphere sintering tests for MLCC components.
features
1. Automatic power-off, over-temperature protection, and leakage prevention mechanisms ensure operational safety
2. The exhaust fan activates automatically upon furnace startup and runs continuously post-experiment until the furnace body temperature drops below 60 °C, then shuts off automatically to effectively protect the furnace surface
3. Constructed with vacuum-adsorbed polycrystalline mullite fiber, the furnace delivers a uniform temperature field and reduces energy consumption by over 50%
4. Advanced air diversion and thermal insulation technology extends the service life of internal components while maintaining consistent temperature performance
5. Automatically compensates for temperature control deviations caused by silicon carbide rod resistance changes due to temperature fluctuations or aging, eliminating inaccuracies and risks associated with manual adjustments
6. The heating module utilizes DC signal regulation for output power, preventing control signal interference from induced electricity
7. The circuit system features continuous heating output, dual-circuit power supply, and separate strong/weak current wiring to enhance overall operational stability
8. Integrates a digital flow display instrument paired with a mass flow controller for data collection and flow regulation, offering excellent repeatability, rapid response, and stable, reliable performance. (Gas Mass Flow Control System)
9. Supports switching between automatic and manual control modes: automatic mode activates/deactivates the vacuum pump via preset values to maintain container pressure within a specified vacuum range, while manual mode allows direct operation via dedicated buttons to accommodate diverse experimental requirements. (Medium Vacuum Control System)
10. Features solenoid valve slow-start technology: the valve opens 10 seconds after vacuum pump activation, maintaining precise pressure within the furnace tube system and preventing exhaust gas backflow that could compromise experimental results. (Medium Vacuum Control System)
specifications
Model | CVD-LTF14P40 | CVD-LTF14P50 | CVD-LTF14P60 | CVD-LTF14P80 |
|---|---|---|---|---|
CVD-LTF14T40 | CVD-LTF14T50 | CVD-LTF14T60 | CVD-LTF14T80 | |
Operatingtemperature range | 300~1400℃ | |||
Temperatureresolution | 1℃ | |||
Temperaturecontrol | ± 1℃ | |||
Heating rate | 0~20℃/min | |||
Heating zonelength | 200mm | 400mm | ||
Length ofconstant temperature zone | 70mm | 140mm | ||
degree ofvacuum | -0.1MPa | |||
Empty furnaceheating time | ≤15min | |||
Heating ratewhen configuring furnace tube | Below 500℃≤5℃/min；500-1000≤10℃/min；1000-1200≤5℃/min；1000-1400≤2℃/min | |||
Exterior | Cold-rolledsteel sheet with chemical-resistant coating on the surface | |||
Furnace body | PolycrystallineMullite Fiber | |||
Furnace size | 360*350*350mm | 560*350*350mm | ||
Furnace tube | CorundumTube | |||
Furnace tubesize | Φ40/34*1000 | Φ50/44*1000 | Φ60/50*1000 | Φ80/70*1000 |
Heater | Siliconcarbide rod | |||
Heatingpower | 3KW | 5KW | ||
Thermalinsulation layer | Double-layerforced air diversion | |||
Open way | No | |||
Controller | P: Importedprogram temperature control digital display; T: 7-inch color touch screenprogram temperature control | |||
Controlmethod | Usingmicrocomputer PID control | |||
How to set | P: Touchfive buttons for action, digital display setting; T: Finger touch and tap toset | |||
Displaymethod | P:Double-line LED digital display; T: Color LCD display | |||
Timing | 0~999.9hours | |||
Run function | Fixed valueoperation, program operation | |||
Program mode | P: Programrunning, 4 curves, a total of 40 steps; T: 50 steps can call the storedprogram | |||
Sensor | Type Sthermocouple | |||
Auxiliaryfunction | P:Correction function; T: Correction function, real-time curve recording, Udisk data export | |||
Safety equipment | Overcurrentleakage protection switch | |||
Number ofair paths | 3 channels(the number of air channels can be selected according to specific needs) | |||
Flow range | 0-0500sccm(standard ml/min, optional) nitrogen standard ±1%F.S | |||
Precision | ||||
Responsetime | ≤4s | |||
Operatingtemperature (flow meter) | 5-45℃ | |||
Workpressure | Inletpressure 0.05-0.3MPa (gauge pressure) | |||
Systemconnection | Adopt KFquick connection bellows, high vacuum manual flapper valve and digital displayvacuum measuring instrument | |||
Systemvacuum range | 10-100Pa | |||
Vacuum pump | Thetheoretical ultimate vacuum degree of the two-stage mechanical pump is 3×10-1Pa,the pumping rate is 4L/s, the air outlet is equipped with an oil filter, therated voltage is 200V, and the power is 0.55Kw | |||
CVD systemconfiguration | 1400 degreevacuum tube furnace Multi-channel mass flow control system Vacuum system | |||
why choose us
Premium Quality with CE & ISO
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20 Years
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