Vacuum Atmosphere Tube Furnace
Vacuum atmosphere tube furnace provides an experimental environment with vacuum, controllable atmosphere and high temperature, and is used in semiconductor, nanotechnology, carbon fiber and other fields.
Open Type Vacuum Atmosphere Tube Furnace for Semiconductor Applications with 50%+ Energy Savings
1200°C Open Type Vacuum Atmosphere Tube Furnace CVD System with Precision Vacuum Control for Semiconductor R&D
1400°C Vacuum Atmosphere Tube Furnace for Semiconductor & Nanotech Applications
1400℃ Vacuum Atmosphere Tube Furnace CVD System for SiC Coating & Sintering
1600°C Vacuum Atmosphere Tube Furnace for Semiconductor R&D with ±1°C Temperature Uniformity
